Press release | May 2019
Following four spectacular exhibitions by Dutch artists including Melanie Bonajo and Anouk Kruithof, Foam’s Next Level series will have a follow-up with international artists. With the support of Ammodo, in the coming four years Foam will annually present an outstanding exhibition by an exceptional mid-career talent. The first to feature in the new series is the British artist Dominic Hawgood. His images, created using the latest digital technologies, are on display in Foam starting 12 July 2019.
'With the Next Level series, Foam has put the spotlight on young talented artists who have shown relevant and innovative work, important for the development of photography. Consequently, Dutch artists received the attention of the public and international professionals. Ammodo is happy to contribute to the international continuation of the series "- Juliette de Wijkerslooth, Director Ammodo
With the support of Ammodo, Foam has been organising the exhibition series Next Level since 2015. The series aims to introduce a broad public to innovative art created by relatively young visual makers who make ground-breaking use of the medium of photography. Next Level is a major project designed to give an impetus to artists with notable accomplishments to their name, but who are not so well known to the general public. For the artists selected so far, it was their first solo exhibition in the Netherlands. The first artist chosen for Next Level was Anne De Vries (2015), followed by Melanie Bonajo (2016), Anouk Kruithof (2017) and the duo Persijn Broersen and Margit Lukács (2018). Dominic Hawgood is the first to feature in the international follow-up to the series.
PROVOCATIVE AND RELEVANT
The Next Level exhibition series forms part of Foam’s talent policy. For the first series, the choice fell deliberately on Dutch artists whose work is relevant to the development of the medium of photography, by their experimentation, by pushing the boundaries of the medium, by taking risks, or by approaching photography in a wholly new way. Not surprisingly, the exhibitions developed for Next Level were often very bold, provocative and surprising, for regular visitors and professionals alike. The exhibitions were often highly topical as well. The featured artists use photography as a medium to respond to contemporary global and societal developments in the wake of digitisation and new technologies. The result is a heightened awareness among the visitors of how images influence our everyday life.
Both domestically and internationally, the Next Level exhibition series was received very well. It also meant that Foam was able to bring the Dutch artists to the attention of international professionals, both through the exhibitions and fringe programmes and events. The series now continues by inviting international artists to Amsterdam. In line with the international character of Foam’s talent policy, the focus now is on international artists whose presentation in Foam can positively impact the Dutch cultural field. This way Foam encourages an exchange and both domestic and international debate on new and relevant developments within the photographic and wider cultural sector.
Next Level: Dominic Hawgood
12 July - 13 October 2019
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